A Novel Process to Prepare Chemoselectively Protected N-PhthaloylChitosan without Drying of Solvent and Purging of Water Vapor

A Novel Process to Prepare Chemoselectively Protected N-PhthaloylChitosan without Drying of Solvent and Purging of Water Vapor

Radna Nurmasari, Uripto Trisno Santoso, Dewi Umaningrum
Department of Chemistry, Faculty of Mathematics and Natural Sciences, Lambung Mangkurat University,
Jl. Jend. A. Yani Km 36 Banjarbaru, Kalimantan Selatan, Indonesia 70714 Phone/Fax: +62-5114773112

A new process for preparing chemoselectively protected N-phthaloyl-chitosan macrospheres, which was simple and practicable, was reported in this paper. Chitosan was phthaloylated using phthalic anhydride in dimethylformamide as solvent with addition of 5% water (v/v) as cosolvent and without drying of solvent to remove the contained water and without flowing of nitrogen to purge water vapor during reaction process. As comparison, the same condition reaction was also performed to prepare N-phthaloyl-chitosan but without addition of 5% water as cosolvent. The FTIR spectra showed that chemoselectively protected N-phthaloylation of chitosan can be prepared without pretreatment of solvent drying and without treatment of water vapor purging during the reaction.

Keywords: selective, protection, phthaloyl, chitosan.

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